Rapidus to Deploy 10 EUV Machines for 2nm Chip Production in Japan

Rapidus, a chip manufacturer from Japan, is gearing up to deploy 10 advanced extreme ultraviolet (EUV) lithography systems across its new production facilities. This initiative is expected to significantly enhance Japan’s position in the advanced chip manufacturing industry. CEO Atsuyoshi Koike revealed these intentions regarding the new IIM-1 and IIM-2 plants, as reported by Nikkan Kogyo Shimbun.

First EUV Machine Arrives

In December 2024, the very first EUV lithography machine landed at New Chitose Airport, marking a historic moment for Japan. As per the company’s schedule, Rapidus aims to begin trial production of 2nm chips at the IIM-1 facility as soon as April 2025, with plans to deliver sample chips to the semiconductor giant Broadcom by June.

Production Capacity Insights

Considering the production potential, projections indicate that if five EUV machines operate at full capacity, IIM-1 could handle between 17,000 and 20,000 wafers per month, given that about 20 EUV layers are involved in the manufacturing process. Rapidus intends to use ASML’s Twinscan NXE:3800E scanner, which has the capability to process up to 220 wafers each hour at a dose of 30mj/cm².

Competing with Industry Giants

With a bold target to achieve mass production of 2nm chips by 2027, Rapidus is entering a competitive arena filled with established players. For instance, TSMC is set to begin its own 2nm chip production in 2025 and has secured significant clients like Apple, NVIDIA, AMD, and Qualcomm.

On the other side, Samsung is also taking steps to adapt some of its 3nm production lines for 2nm technology, conducting tests collaboratively with companies such as NVIDIA and Qualcomm.

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