TECNO, a prominent technology company, has renewed its collaboration with the UN Refugee Agency (UNHCR) to bolster its global primary education initiative. Since the partnership's inception in 2020, the focus has been on delivering quality education to refugee children and youth throughout Africa.
Impact and Future Goals
Over the past four years, this alliance has positively influenced 17,370 refugee children and 40 scholars from the DAFI program. It has also offered vital support to educators and educational institutions. Looking ahead to 2024, TECNO’s contributions aim to assist over 7,000 children in Kenya, contributing to the goal of enrolling 11,500 new refugee students this year.
Kenya, accommodating 774,370 refugees as of May 2024, ranks as the fifth-largest refugee-hosting nation in Africa. Refugee camps such as Dadaab and Kakuma, along with the Kalobeyei Settlement Center, are home to over 217,000 school-aged children. Despite ongoing efforts, only 53% of these children are currently enrolled in schools, underscoring the critical need for educational assistance.
Educational Support Initiatives
TECNO’s financial contributions for 2024 are directed towards enhancing educational outcomes by supplying students with learning materials, providing hygiene kits for girls, improving school infrastructure, and equipping teachers with necessary resources. These initiatives are vital for empowering refugee children to succeed.
Adriani Wahjanto, UNHCR Deputy Representative in China, commended TECNO’s steadfast support, noting, “Their commitment helps bridge the gap in access to education for refugee children and creates opportunities for a brighter future.” Jack Guo, TECNO’s General Manager, remarked, “Education is the key to changing the destiny of refugee children, and we are proud to support this cause.”
A Commitment to a Better Future
With this renewed collaboration, TECNO and UNHCR are united in their efforts to enhance education for refugee children in Kenya and beyond, offering them a pathway to a better future.