Corning Extreme ULE Glass: Unmatched Thermal Stability
Corning has introduced a brand new ultra-low expansion (ULE) material designed to meet the demands of the upcoming low-NA and high-NA EUV lithography systems. This innovative Extreme ULE glass is expected to become the preferred choice for the next-generation photomasks and lithography mirrors in future fabrication tools. Exceptional Features The standout characteristic of Extreme ULE is […]
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